Open AccessMisalignment measurement with dual-frequency moiré fringe in nanoimprint lithography
Author(s) -
Nan Wang,
Wei Jiang,
Yu Zhang
Publication year - 2020
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.382413
Subject(s) - nanoimprint lithography , moiré pattern , optics , lithography , materials science , wafer , beat (acoustics) , electron beam lithography , optoelectronics , resist , physics , fabrication , nanotechnology , medicine , alternative medicine , pathology , layer (electronics)