Open AccessStability of Cr/C multilayer during synchrotron radiation exposure and thermal annealing
Author(s) -
Jiangtao Feng,
Qiushi Huang,
Runze Qi,
Xudong Xu,
Hongjun Zhou,
Tonglin Huo,
Angelo Giglia,
Xiaowei Yang,
Hongchang Wang,
Zhong Zhang,
Zhanshan Wang
Publication year - 2019
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.038493
Subject(s) - synchrotron radiation , materials science , irradiation , annealing (glass) , optics , thermal stability , synchrotron , x ray photoelectron spectroscopy , diffraction , scattering , radiation , analytical chemistry (journal) , nuclear magnetic resonance , chemistry , physics , composite material , organic chemistry , chromatography , nuclear physics
The stability of Cr/C multilayer during irradiation or thermal annealing was investigated using grazing incidence X-ray reflectivity measurement, X-ray photoelectron spectroscopy, X-ray diffraction analysis, small-angle X-ray scattering analysis, and soft X-ray reflectivity measurement. One sample was irradiated with a white beam of synchrotron radiation and five other samples were annealed at various temperatures. The 18-h irradiation treatment caused local surface contaminants but did not affect the buried stacks. The annealing treatment resulted in increased reflectivity at approximately 1.2 keV, and the multilayer remained stable for temperature up to 700 °C. Thus, the Cr/C multilayers exhibited excellent stability during irradiation and thermal treatments and can be used for the mirrors and multilayer gratings of third-generation synchrotron radiation systems.