Open AccessPreparation of sol-gel ZrO2 films with high laser-induced damage threshold under high temperature
Author(s) -
Yongqiao Zhu,
Ming Ma,
Pu Zhang,
Wenzhe Cai,
Dawei Li,
Cheng Xu
Publication year - 2019
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.037568
Subject(s) - materials science , annealing (glass) , sol gel , silicone , microstructure , composite material , chemical engineering , analytical chemistry (journal) , nanotechnology , chemistry , organic chemistry , engineering
In this study, three different types of ZrO 2 films were prepared with different precursors and additives using the sol-gel method. High-temperature annealing was implemented to investigate the impact of temperature on optical properties, microstructure, surface morphologies and absorption of these films. According to the laser-induced damage threshold (LIDT) tests on films having experienced annealing and those implemented with in-situ high temperature, the ZrO 2 film with ZrOCl 2 ·8H 2 O as the precursor and copolymer of silicone and polyaldoxyl ether as the additive had the highest resistance to laser-induced damage. After annealing at 623 K, its LIDT was 21.4 J/cm 2 , while that at an in-situ high temperature of 523 K was 23.9 J/cm 2 . The strong high temperature resistance was likely attributed to the usage of carbon-free precursor and high temperature-resistant additive, which contributed to low carbon contents and less structural damage caused by organic matter evaporation. In this context, there were less high temperature-induced impurity and structural defects, leading to higher LIDT values. This study provided a novel method for preparing high temperature-resistant sol-gel films, which shed light upon wider potential application of sol-gel films at high-temperature conditions.