Open AccessFabrication of nano/micro dual-periodic structures by multi-beam evanescent wave interference lithography using spatial beats
Author(s) -
Shuzo Masui,
Y. Torii,
Masaki Michihata,
Kiyoshi Takamasu,
Satoru Takahashi
Publication year - 2019
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.031522
Subject(s) - interference lithography , optics , grating , lithography , materials science , fabrication , electron beam lithography , rigorous coupled wave analysis , interference (communication) , photolithography , beam splitter , electromagnetically induced grating , optoelectronics , talbot effect , x ray lithography , diffraction grating , photonic crystal , beam (structure) , nanodot , nano , resist , physics , nanotechnology , blazed grating , laser , channel (broadcasting) , alternative medicine , pathology , engineering , composite material , layer (electronics) , medicine , electrical engineering
We propose an effective method for fabricating dual-periodic structures using the combination of multi-beam interference lithography and evanescent wave exposure. Four-beam evanescent wave interference lithography (EWIL) is used as a prototype to demonstrate the fabrication feasibility of one-dimensional (1D) micro-grating structures covered with nanodots and two-dimensional microdot structures filled with subwavelength fringes by designing reciprocal lattice vectors of interference fringes. We experimentally fabricated 1D nano-/micro-grating structures with periods of 140 nm and 12.5 µm and microdots filled with subwavelength gratings of 450 nm period by four-beam EWIL. These structures are applicable to superlattice photonic crystals and subwavelength structured surfaces.