Fabrication of nano/micro dual-periodic structures by multi-beam evanescent wave interference lithography using spatial beats | Zendy

Shuzo Masui | Zendy; Y. Torii | Zendy; Masaki Michihata | Zendy; Kiyoshi Takamasu | Zendy; Satoru Takahashi | Zendy

Open Access

Fabrication of nano/micro dual-periodic structures by multi-beam evanescent wave interference lithography using spatial beats

Author(s) -

Shuzo Masui,

Y. Torii,

Masaki Michihata,

Kiyoshi Takamasu,

Satoru Takahashi

Publication year - 2019

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.27.031522

Subject(s) - optics , interference lithography , grating , lithography , materials science , fabrication , electron beam lithography , interference (communication) , photolithography , beam splitter , rigorous coupled wave analysis , optoelectronics , electromagnetically induced grating , talbot effect , diffraction grating , nanodot , beam (structure) , resist , physics , nanotechnology , holographic grating , laser , medicine , channel (broadcasting) , alternative medicine , engineering , pathology , layer (electronics) , electrical engineering

We propose an effective method for fabricating dual-periodic structures using the combination of multi-beam interference lithography and evanescent wave exposure. Four-beam evanescent wave interference lithography (EWIL) is used as a prototype to demonstrate the fabrication feasibility of one-dimensional (1D) micro-grating structures covered with nanodots and two-dimensional microdot structures filled with subwavelength fringes by designing reciprocal lattice vectors of interference fringes. We experimentally fabricated 1D nano-/micro-grating structures with periods of 140 nm and 12.5 µm and microdots filled with subwavelength gratings of 450 nm period by four-beam EWIL. These structures are applicable to superlattice photonic crystals and subwavelength structured surfaces.

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