Open AccessDirect UV written integrated planar waveguides using a 213 nm laser
Author(s) -
Paul C. Gow,
Rex H. S. Bannerman,
Paolo L. Mennea,
Christopher Holmes,
James C. Gates,
Peter G. R. Smith
Publication year - 2019
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.029133
Subject(s) - optics , materials science , fluence , planar , laser , fabrication , refractive index , optoelectronics , wavelength , physics , pathology , computer science , medicine , computer graphics (images) , alternative medicine
We present the first demonstration of integrated waveguides in planar silica devices fabricated using direct UV writing with 213 nm laser light. Waveguides were produced with different writing fluences and the NA and MFD of each were measured. Single mode waveguides were achieved at fluence values one-tenth that typically required when operating with a 244 nm laser, allowing for more rapid fabrication. A maximum in-plane index change of 2.4 ×10 -3 for a writing fluence of 5 kJ cm -2 was estimated from NA measurements. Finally cutback measurements were performed and a propagation loss of 0.42 ± 0.07 dB cm -1 was directly measured, though losses as low as 0.2 ± 0.03 dB/cm are indicated through calculations.