Open AccessPhotoresist-free, laser-assisted chemical etching process for long-period fiber grating
Author(s) -
Seyed Reza Hosseini Largani,
HsinYi Wen,
Jing-Luen Chen,
ChiaChin Chiang
Publication year - 2019
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.028606
Subject(s) - materials science , photoresist , optics , etching (microfabrication) , isotropic etching , excimer laser , grating , laser , optoelectronics , long period fiber grating , reactive ion etching , dry etching , fiber , composite material , dispersion shifted fiber , fiber optic sensor , physics , layer (electronics)
In this study, we propose a photoresist-free, laser-assisted wet chemical etching process used to control the grating depth of a long-period fiber grating (LPFG) termed laser-assisted etching LPFG (LLPFG). This process can considerably reduce production time, while the photoresist-free laser etching allows tiny long-period notches to be etched on the fiber surface, distinguishing the etching rate of the process from that of standard wet etching processes. The LLPFG, which has a period of 610 µm, was scanned using a KrF excimer laser. The results showed a resonant-attenuation wavelength of 1551 nm through a fiber diameter of 60 µm and a grating depth of 26 µm and to being a green process due to the photoresist-free etching.