Open AccessSingle step fabrication of nano scale optical devices using binary contact mask deep UV interference lithography
Author(s) -
David Lombardo,
Piyush Shah,
Andrew Sarangan
Publication year - 2019
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.022917
Subject(s) - lithography , optics , fabrication , grating , materials science , interference lithography , photolithography , interference (communication) , nanoimprint lithography , wavefront , diffraction grating , beam splitter , optoelectronics , computer science , physics , laser , telecommunications , medicine , channel (broadcasting) , alternative medicine , pathology
Interference Lithography (IL) is a powerful and inexpensive tool for large area precision nanoscale patterning of periodic structures. In this work we extend IL's capability to create features in arbitrary shapes and locations through the use of binary contact masks with wavefront division deep-UV interference lithography. Grating couplers for use in a streak measurement system and a focal plane division polarimeter are created to demonstrate the viability and versatility of the technique. Simultaneous fabrication of 90nm and 20μm features proves the potential of this process to simplify and streamline common fabrication processes in research and in industrial applications.