Two-dimensional silicon photonic grating coupler with low polarization-dependent loss and high tolerance | Zendy

Yanyun Xue | Zendy; Hao Chen | Zendy; Yujin Bao | Zendy; Jianji Dong | Zendy; Xinliang Zhang | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Two-dimensional silicon photonic grating coupler with low polarization-dependent loss and high tolerance

Author(s) -

Yanyun Xue,

Hao Chen,

Yujin Bao,

Jianji Dong,

Xinliang Zhang

Publication year - 2019

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.27.022268

Subject(s) - grating , materials science , silicon on insulator , optics , etching (microfabrication) , polarization (electrochemistry) , optoelectronics , silicon , photonics , diffraction grating , silicon photonics , photonic integrated circuit , nanotechnology , physics , chemistry , layer (electronics)

We design and demonstrate a two-dimensional grating coupler with an elliptical-like etching pattern on the silicon-on-insulator platform. The polarization-dependent loss of the fabricated device is measured to be 0.2 dB at the C-band, lower than that of most conventional 2D GCs. The etching unit can be easily fabricated with a large tolerance of ± 10 nm and a large feature size of 310nm, which is beneficial to its manufacturing process and wide application.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research