Open AccessTwo-dimensional silicon photonic grating coupler with low polarization-dependent loss and high tolerance
Author(s) -
Yanyun Xue,
Hao Chen,
Yujin Bao,
Jianji Dong,
Chi Zhang
Publication year - 2019
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.022268
Subject(s) - materials science , grating , silicon on insulator , optics , etching (microfabrication) , polarization (electrochemistry) , optoelectronics , silicon , diffraction grating , photonics , photonic integrated circuit , insertion loss , nanotechnology , physics , chemistry , layer (electronics)
We design and demonstrate a two-dimensional grating coupler with an elliptical-like etching pattern on the silicon-on-insulator platform. The polarization-dependent loss of the fabricated device is measured to be 0.2 dB at the C-band, lower than that of most conventional 2D GCs. The etching unit can be easily fabricated with a large tolerance of ± 10 nm and a large feature size of 310nm, which is beneficial to its manufacturing process and wide application.