Open AccessMonolithic chip-scale structural color filters fabricated with simple UV lithography
Author(s) -
Tingbiao Guo,
Julian Evans,
Nan Wang,
Sailing He
Publication year - 2019
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.021646
Subject(s) - materials science , color filter array , lithography , color gel , optics , optoelectronics , layer (electronics) , filter (signal processing) , optical filter , photolithography , structural coloration , chip , photonic crystal , nanotechnology , computer science , telecommunications , physics , computer vision , thin film transistor
We demonstrate an improved approach to integrate various color filters on a chip-scale by using stepwise metal-insulator-metal FP cavities. The cavity is composed of a thick silver mirror, an SU8 gap layer of controlled thickness, and a thin nickel layer. Reflective colors from red to blue can be generated from these filters through a simple UV lithography process. The filters were also fabricated on a flexible substrate which could be incorporated into wearable devices. This method can realize large-scale filter arrays with simple processing and may facilitate the use of structural color filters in displays and sensing.