Open AccessHWCVD a-Si:H interlayer slope waveguide coupler for multilayer silicon photonics platform
Author(s) -
Rafidah Petra,
Swe Zin Oo,
Antulio Tarazona,
Robert Čerňanský,
Scott A. Reynolds,
Ali Z. Khokhar,
Vinita Mittal,
David J. Thomson,
Alberto Politi,
Goran Z. Mashanovich,
Graham T. Reed,
Harold M. H. Chong
Publication year - 2019
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.015735
Subject(s) - waveguide , materials science , optics , chemical vapor deposition , silicon , wavelength , photonics , silicon photonics , optoelectronics , amorphous silicon , crystalline silicon , physics
We present interlayer slope waveguides, designed to guide light from one level to another in a multi-layer silicon photonics platform. The waveguide is fabricated from hydrogenated amorphous silicon (a-Si:H) film, deposited using hot-wire chemical vapor deposition (HWCVD) at a temperature of 230°C. The interlayer slope waveguide is comprises of a lower level input waveguide and an upper level output waveguide, connected by a waveguide on a slope, with vertical separation to isolate other crossing waveguides. Measured loss of 0.17 dB/slope was obtained for waveguide dimensions of 600 nm waveguide width (w) and 400 nm core thickness (h) at a wavelength of 1550 nm and for transverse electric (TE) mode polarization.