Open AccessEnhanced two-photon absorption and two-photon luminescence in monolayer MoS2 and WS2 by defect repairing
Author(s) -
Xiaofeng Dai,
Xiaoyan Zhang,
I. M. Kislyakov,
Lei Wang,
Jiawei Huang,
Saifeng Zhang,
Ningning Dong,
Jun Wang
Publication year - 2019
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.013744
Subject(s) - monolayer , luminescence , materials science , absorption (acoustics) , relaxation (psychology) , two photon absorption , photon , attenuation coefficient , optoelectronics , photochemistry , molecular physics , optics , nanotechnology , chemistry , laser , physics , psychology , social psychology , composite material
In this work, we investigated the nonlinear optical properties of monolayer MoS 2 and WS 2 modulated by defect engineering via chemical treatment. The results demonstrate that the two-photon luminescence (TPL) and two-photon absorption (TPA) coefficient were remarkably improved after the repair of sulfur vacancies for both monolayer MoS 2 and WS 2 . After the chemical treatment, the nonradiative relaxation path dominant in pristine monolayer MoS 2 is significantly alleviated, resulting in enhanced TPL. Our work affords an effective way to tailor the nonlinear absorption, luminescence and relaxation properties of sulfur-based two-dimensional metal dichalcogenides by defect engineering.