Open AccessEfficient optical proximity correction based on semi-implicit additive operator splitting
Author(s) -
Yongming Shen,
Fei Peng,
Zhenrong Zhang
Publication year - 2019
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.27.001520
Subject(s) - discretization , computation , photolithography , computer science , operator (biology) , tridiagonal matrix , alternating direction implicit method , computational lithography , convergence (economics) , lithography , algorithm , optical proximity correction , optics , mathematical optimization , mathematics , physics , mathematical analysis , x ray lithography , eigenvalues and eigenvectors , finite difference method , materials science , repressor , economic growth , chemistry , composite material , biochemistry , layer (electronics) , quantum mechanics , transcription factor , resist , economics , gene
Inverse lithography techniques (ILT) have been extensively used by the semiconductor industry to compensate for the inherent image distortions in optical lithography. However, the iterative ILT optimization procedure requires rather prohibitive time steps leading to poor efficiency with explicit time discretization. In this paper, a semi-implicit time discretization scheme is applied, enabling stable computation of mask synthesis with large time steps. Additive operator splittering (AOS) is implemented with respect to coordinate axes, reducing mask synthesis to consecutive one-dimensional updates represented by tridiagonal linear equations, which is solved efficiently by the Thomas algorithm. Simulation results merit the superiority of the proposed semi-implicit approach with improved convergence performance.