Open AccessHigh resolution full field wavefront measurement of a misaligned miniature lens
Author(s) -
Hung Sheng Chang,
Chao Liang
Publication year - 2018
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.26.031209
Subject(s) - optics , wavefront , lens (geology) , coma (optics) , physics , collimator , optical aberration , wavefront sensor , astigmatism , spherical aberration , field (mathematics) , mathematics , pure mathematics
Compared with the industry standard MTF consequential testing result, the full field transmitted wavefront testing is more analytical for field aberration analysis. A novel wavefront measuring device specialized for the miniature lens testing application is developed to measure the full field aberration in a high resolution of 35x36 radial-azimuthal fields. The device adapts the high dynamic range Shack-Hartman wavefront sensor to minimize the alignment uncertainty induced from collimator under high field angle. The plane symmetrical aberration due to elements misalignment is identified and quantified throughout the measured field. The field constant coma and field linear astigmatism contributes most aberration errors to the edge of the field as expected. Through the field dependent aberration analysis. This device proves that the miniature lens image quality near the edge of the field is practically limited by the misalignment of the optical elements.