Open AccessControl of thermal radiation in metal hole array structures formed by anisotropic anodic etching of Al
Author(s) -
Toshiaki Kondo,
Shun Hasegawa,
Takashi Yanagishita,
Naoshi Kimura,
Takashi Toyonaga,
Hideki Masuda
Publication year - 2018
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.26.027865
Subject(s) - materials science , etching (microfabrication) , optics , optoelectronics , anode , radiation , thermal , masking (illustration) , isotropic etching , aperture (computer memory) , nanotechnology , electrode , art , chemistry , physics , layer (electronics) , meteorology , acoustics , visual arts
An efficient preparation process for Al hole array structures emitting wavelength-selective thermal radiation that is based on the anisotropic anodic etching of Al was demonstrated. The formation of an ordered hole array was achieved by a masking process prior to the anodic etching. The present process allows the preparation of large samples because the masking of the Al foil has a high throughput owing to the simple printing process using a flexible stamp. The thermal radiation properties of the Al hole array could be controlled by adjusting the depth and aperture size of the holes.