Open AccessPlanar dielectric cylindrical lens at 800 nm and the role of fabrication imperfections
Author(s) -
Joo Young Ha,
Abdoulaye Ndao,
Li-Yi Hsu,
Junhee Park,
Boubacar Kanté
Publication year - 2018
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.26.023178
Subject(s) - optics , planar , fabrication , lens (geology) , materials science , dielectric , wedge (geometry) , aperture (computer memory) , total internal reflection , numerical aperture , optoelectronics , physics , wavelength , acoustics , computer science , medicine , alternative medicine , computer graphics (images) , pathology
Conventional optical components have been proposed to realize high-quality line focusing with uniform intensity distribution such as cylindrical lenses, segmented wedge-arrays, or a combination of prisms and spherical mirrors. Numerous factors such as the manufacturing tolerances or the need for precise alignment of conventional lenses cause wave front aberrations that impact the performance of optical systems. These aforementioned limitations affect the uniformity of the intensity distribution and the intercept factor of lenses. Here, we experimentally demonstrate an integrable planar dielectric cylindrical lens made of titanium dioxide for uniform line focusing and discuss the sensitivity of its performance to fabrication imperfections originating from non-ideal geometrical parameters. The lens has a numerical aperture of 0.247, an intercept factor of 0.85, and an efficiency of 79% at 800 nm.