Open AccessHigh-power modular LED-based illumination systems for mask-aligner lithography
Author(s) -
Johana Bernasconi,
Toralf Scharf,
Uwe Vogler,
Hans Peter Herzig
Publication year - 2018
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.26.011503
Subject(s) - optics , lithography , light emitting diode , arc lamp , materials science , optoelectronics , mercury vapor lamp , wavelength , led lamp , photolithography , incandescent light bulb , diode , physics
Mask-aligner lithography is traditionally performed using mercury arc lamps with wavelengths ranging from 250 nm to 600 nm with intensity peaks at the i, g and h lines. Since mercury arc lamps present several disadvantages, it is of interest to replace them with high power light emitting diodes (LEDs), which recently appeared on the market at those wavelengths. In this contribution, we present a prototype of an LED-based mask-aligner illumination. An optical characterization is made and the prototype is tested in a mask-aligner. Very good performances are demonstrated. The measured uniformity in the mask plane is 2.59 ± 0.24 % which is within the uniformity of the standard lamp. Print tests show resolution of 1 micron in contact printing and of 3 microns in proximity printing with a proximity gap of 30 microns.