Open AccessInterferometric profile measurement of optical-thickness by wavelength tuning with suppression of spatially uniform error
Author(s) -
Yangjin Kim,
Kenichi Hibino,
Mamoru Mitsuishi
Publication year - 2018
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.26.010870
Subject(s) - optics , interferometry , fizeau interferometer , wavelength , phase (matter) , materials science , white light interferometry , astronomical interferometer , physics , quantum mechanics
Wavelength-tuning interferometry has been widely used for measuring the thickness variation of optical devices used in the semiconductor industry. However, in wavelength-tuning interferometry, the nonlinearity of phase shift causes a spatially uniform error in the calculated phase distribution. In this study, the spatially uniform error is formulated using Taylor series. A new 9-sample phase-shifting algorithm is proposed, with which the uniform spatial phase error can be eliminated. The characteristics of 9-sample algorithm is discussed using Fourier representation and RMS error analysis. Finally, optical-thickness variation of transparent plate is measured using the proposed algorithm and wavelength-tuning Fizeau interferometer and the error is compared with 7-sample algorithm.