Open AccessLow loss poly-silicon for high performance capacitive silicon modulators
Author(s) -
Maurin Douix,
Charles Baudot,
Delphine MarrisMorini,
Alexia Valéry,
Daivid Fowler,
P. Acosta-Alba,
S. Kerdilès,
C. Euvrard,
R. Blanc,
R. Beneyton,
A. Souhaité,
S. Crémer,
N. Vulliet,
Laurent Vivien,
F. Bœuf
Publication year - 2018
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.26.005983
Subject(s) - materials science , silicon , wafer , optoelectronics , chemical vapor deposition , hybrid silicon laser , fabrication , amorphous silicon , silicon oxide , amorphous solid , silicon photonics , annealing (glass) , optics , crystalline silicon , composite material , silicon nitride , medicine , alternative medicine , chemistry , organic chemistry , physics , pathology
Optical properties of poly-silicon material are investigated to be integrated in new silicon photonics devices, such as capacitive modulators. Test structure fabrication is done on 300 mm wafer using LPCVD deposition: 300 nm thick amorphous silicon layers are deposited on thermal oxide, followed by solid phase crystallization anneal. Rib waveguides are fabricated and optical propagation losses measured at 1.31 µm. Physical analysis (TEM ASTAR, AFM and SIMS) are used to assess the origin of losses. Optimal deposition and annealing conditions have been defined, resulting in 400 nm-wide rib waveguides with only 9.2-10 dB/cm losses.