Open AccessMicro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography
Author(s) -
Ziang Zhang,
Litong Dong,
Yunfeng Ding,
Li Li,
Zhankun Weng,
Zuobin Wang
Publication year - 2017
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.25.029135
Subject(s) - optics , interference lithography , materials science , interference (communication) , electron beam lithography , lithography , maskless lithography , laser , nano , laser beams , beam (structure) , nanoscopic scale , optoelectronics , modulation (music) , nanotechnology , physics , fabrication , telecommunications , resist , medicine , channel (broadcasting) , alternative medicine , pathology , layer (electronics) , computer science , acoustics , composite material