Open AccessInformation theoretical aspects in coherent optical lithography systems
Author(s) -
Xu Ma,
Hao Zhang,
Zhiqiang Wang,
Yanqiu Li,
Gonzalo R. Arce,
Javier GarciaFrias,
Lu Zhang
Publication year - 2017
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.25.029043
Subject(s) - lithography , computational lithography , photolithography , optics , maskless lithography , x ray lithography , immersion lithography , photomask , extreme ultraviolet lithography , computer science , physics , materials science , electron beam lithography , nanotechnology , resist , layer (electronics)
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