Open AccessOptimal polarization modulation for orthogonal two-axis Lloyd’s mirror interference lithography
Author(s) -
Xiuguo Chen,
Zongwei Ren,
Yuki Shimizu,
Yuan Liu Chen,
Wei Gao
Publication year - 2017
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.25.022237
Subject(s) - optics , polarization (electrochemistry) , physics , interferometry , interference (communication) , interference lithography , orthogonal polarization spectral imaging , ray , lithography , laser , telecommunications , computer science , medicine , channel (broadcasting) , chemistry , alternative medicine , pathology , fabrication
Polarization control is of vital importance in two-axis Lloyd's mirror interference lithography to achieve the preferred interference fringes. In this work, we first establish a three-dimensional polarization ray-tracing model to trace the evolution of polarization states of incident beams through the corner-cube-like interferometer unit of an orthogonal two-axis Lloyd's mirror interferometer. With the established model, we then derive the optimal combination of initial polarization directions of the incident beams according to the orthogonality of polarization states and the contrast of interference fringes. The comparison between the simulated and experimental interference fringes obtained under different combinations of initial polarization states of incident beams verify the feasibility of the established model and the achieved optimal polarization modulation.