Open AccessMoiré method for nanometer instability investigation of scanning hard x-ray microscopes
Author(s) -
Ulrich Vogt,
Daniel D. Kohler,
Jannis Dickmann,
Jussi Rahomäki,
Karolis Parfeniukas,
S. Kubsky,
Filipe Alves,
Florent Langlois,
Christer Engblom,
Tomaš Stankevič
Publication year - 2017
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.25.012188
Subject(s) - optics , microscope , synchrotron radiation , materials science , optical microscope , diffraction , x ray optics , microscopy , nanometre , moiré pattern , beam (structure) , synchrotron , scanning electron microscope , physics , x ray
We present a Moiré method that can be used to investigate positional instabilities in a scanning hard x-ray microscope with nanometer precision. The development of diffraction-limited storage rings offering highly-brilliant synchrotron radiation and improvements of nanofocusing x-ray optics paves the way towards 3D nanotomography with 10 nm resolution or below. However, this trend demands improved designs of x-ray microscope instruments which should offer few-nm beam stabilities with respect to the sample. Our technique can measure the position of optics and sample stage relative to each other in the two directions perpendicular to the beam propagation in a scanning x-ray microscope using simple optical components and visible light. The usefulness of the method was proven by measuring short and long term instabilities of a zone-plate-optics-based prototype microscope. We think it can become an important tool for the characterization of scanning x-ray microscopes, especially prior to experiments with an actual x-ray beam.