Open AccessFabrication of diamond microlenses by chemical reflow method
Author(s) -
Tianfei Zhu,
Jiao Fu,
Wei Wang,
Feng Wen,
Jingwen Zhang,
Renan Bu,
Mingtao Ma,
Hongxing Wang
Publication year - 2017
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.25.001185
Subject(s) - diamond , photoresist , photolithography , materials science , optics , fabrication , substrate (aquarium) , etching (microfabrication) , microlens , dry etching , isotropic etching , numerical aperture , chemical vapor deposition , curvature , aperture (computer memory) , optoelectronics , nanotechnology , lens (geology) , composite material , medicine , wavelength , oceanography , physics , alternative medicine , layer (electronics) , pathology , geology , geometry , mathematics , acoustics
We introduce a chemical reflow method to fabricate diamond microlenses. First, photoresist pillars developed by photolithography are reflowed in organic solvent vapor atmosphere at 20 °C to form spherical segment patterns on diamond substrate. The effects of chemical solvent type and reflow time on photoresist pattern profiles are investigated. Second, via dry etching, diamond microlenses are fabricated by transferring the spherical segment pattern into substrate. Furthermore, these diamond microlenses demonstrate low numerical aperture, well-controllable curvature, and good imaging performance with projecting experiment.