Open AccessModeling and experimental study of plasmonic lens imaging with resolution enhanced methods
Author(s) -
Zeyu Zhao,
Yanhong Luo,
Na Yao,
Wei Zhang,
Changtao Wang,
Ping Gao,
Chengwei Zhao,
Mingbo Pu,
Xiangang Luo
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.027115
Subject(s) - optics , plasmon , plasmonic lens , lens (geology) , materials science , lithography , optical transfer function , wavelength , point spread function , surface plasmon , resolution (logic) , optoelectronics , physics , surface plasmon polariton , artificial intelligence , computer science
Plasmonic lens imaging with some resolution enhancement methods are investigated in this paper, mainly by physical modeling and numerical simulations. The imaging model is based on the refined optical transfer function with extra reflection in imaging space and measured in variant magnetic and electric field components. The influences of structured light illumination and mask patterns ' modifications are considered as well. As experimental demonstrations, L-shaped slits pattern with a half-pitch of 60 nm is successfully imaged with 50 nm air distance, by using plasmonic cavity lens lithography and off-axis illumination with 365 nm wavelength light. This study is believed to provide the model and methods for the design of high resolution plasmonic lens employed in nano lithography and optical storage etc.