Open AccessControllable anisotropic wetting characteristics on silicon patterned by slit-based spatial focusing of femtosecond laser
Author(s) -
Tianyuan Wang,
Lan Jiang,
Xin Li,
Jie Hu,
Qingsong Wang,
Sen Ye,
Hao Zhang,
Yongfeng Lu
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.025732
Subject(s) - materials science , optics , anisotropy , femtosecond , slit , fluence , laser , silicon , polarization (electrochemistry) , optoelectronics , physics , chemistry
We propose a promising method to fabricate controllable anisotropic morphologies in which the slit-based spatial focusing of femtosecond laser is used to create an elliptical-shaped intensity distribution at focal plane, inducing elliptical-shaped morphology with micro/nano-dual-scale structures. Our study shows that 1) by increasing slit width, minor axis increases while major axis and axial ratio decrease; 2) with fixed slit width and laser fluence above the threshold, axial ratio is independent of irradiation pulse number; and 3) when polarization direction is changed from 0° to 90°, the axial ratio of anisotropic morphology declines. As a case study, large-area periodic anisotropic hierarchical structures are fabricated with the bidirectional anisotropic wetting.