
Extreme field enhancement in nano-gap plasmonic cavity via 90% efficient coupling with silicon waveguide
Author(s) -
Young Ho Jin,
Byoung Jun Park,
Myung Ki Kim
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.025540
Subject(s) - silicon on insulator , plasmon , materials science , optics , waveguide , optoelectronics , silicon , surface plasmon , coupling (piping) , physics , metallurgy
We propose a novel design for a sub-5-nm-gap plasmonic cavity to couple it efficiently with an integrated low loss silicon waveguide. We numerically obtain over 90% efficient coupling between a nano-gap plasmonic cavity with a modal volume of less than 10 -7 λ 3 and a conventional silicon-on-insulator (SOI) waveguide by utilizing the anti-symmetric second-order resonance mode of the cavity and engineering its geometry to reduce the modal size to less than 5 nm. The electromagnetic field efficiently coupled to the small cavity, leading to extreme enhancement of the field intensity. For a 2-nm-gap cavity, the intensity enhancement was calculated to be more than 100,000,000 compared to that of light in an SOI waveguide.