Open AccessEnhanced third harmonic generation in a silicon metasurface using trapped mode
Author(s) -
Wenyuan Tong,
Gong Cheng,
Xiaojun Liu,
Shuai Yuan,
Qingzhong Huang,
Jinsong Xia,
Yi Wang
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.019661
Subject(s) - silicon , optics , materials science , polarization (electrochemistry) , dielectric , extinction ratio , optoelectronics , second harmonic generation , energy conversion efficiency , slab , light intensity , physics , laser , wavelength , chemistry , geophysics
We experimentally demonstrate enhanced third harmonic generation (THG) using a silicon metasurface, which is consist of symmetric spindle-shape nanoparticle array. Relying on the trapped mode supported by the high quality factor all-dielectric metasurface, the conversion efficiency of THG is about 300 times larger than that of bulk silicon slab. The maximum extinction ratio of the intensity of THG reaches about 25 dB by tuning the polarization of incident light. The simulation results agree with the experimental performances.