Open AccessHigh throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography
Author(s) -
Libin Sun,
Xiaolin Hu,
Qingjun Wu,
Liansheng Wang,
Jun Zhao,
Yang Shen,
Renzhong Tai,
HansJörg Fecht,
Dongxian Zhang,
Liqiang Wang,
Jianzhong Jiang
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.019112
Subject(s) - materials science , image stitching , optics , fabrication , lithography , plasmon , aperture (computer memory) , surface plasmon polariton , optoelectronics , interference (communication) , color filter array , extraordinary optical transmission , surface plasmon , transmittance , color gel , nanotechnology , physics , computer science , telecommunications , layer (electronics) , medicine , channel (broadcasting) , alternative medicine , pathology , acoustics , thin film transistor
Plasmonic color filters in mass production have been restricted from current fabrication technology, which impede their applications. Soft-X-ray interference lithography (XIL) has recently generated considerable interest as a newly developed technique for the production of periodic nano-structures with resolution theoretically below 4 nm. Here we ameliorate XIL by adding an order sorting aperture and designing the light path properly to achieve perfect-stitching nano-patterns and fast fabrication of large-area color filters. The fill factor of nanostructures prepared on ultrathin Ag films can largely affect the transmission minimum of plasmonic color filters. By changing the fill factor, the color can be controlled flexibly, improving the utilization efficiency of the mask in XIL simultaneously. The calculated data agree well with the experimental results. Finally, an underlying mechanism has been uncovered after systematically analyzing the localized surface plasmon polaritons (LSPPs) coupling in electric field distribution.