Open AccessDesign and fabrication of a diffractive beam splitter for dual-wavelength and concurrent irradiation of process points
Author(s) -
Jun Amako,
Shengwen Yu
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.016111
Subject(s) - optics , beam splitter , photoresist , materials science , wavelength , splitter , fabrication , brightness , spatial light modulator , optoelectronics , photolithography , laser , physics , nanotechnology , medicine , alternative medicine , layer (electronics) , pathology
We report on a dual-wavelength diffractive beam splitter designed for use in parallel laser processing. This novel optical element generates two beam arrays of different wavelengths and allows their overlap at the process points on a workpiece. To design the deep surface-relief profile of a splitter using a simulated annealing algorithm, we introduce a heuristic but practical scheme to determine the maximum depth and the number of quantization levels. The designed corrugations were fabricated in a photoresist by maskless grayscale exposure using a high-resolution spatial light modulator. We characterized the photoresist splitter, thereby validating the proposed beam-splitting concept.