Open AccessFabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method
Author(s) -
Xinghui Li,
Kai Ni,
Qian Zhou,
Xiaohao Wang,
Rui Tian,
Jinchao Pang
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.010759
Subject(s) - optics , grating , interference lithography , lithography , materials science , interference (communication) , electromagnetically induced grating , blazed grating , electron beam lithography , lens (geology) , diffraction grating , line (geometry) , fabrication , resist , optoelectronics , physics , nanotechnology , telecommunications , medicine , channel (broadcasting) , alternative medicine , geometry , mathematics , pathology , layer (electronics) , computer science
We introduce a novel dual-beam interference lithography (IL) method that makes it possible to fabricate a concave grating with a large line spacing. A concave lens is placed between two point sources for spatial interference and a concave substrate to produce the grating pattern. The original positions of the two point sources are separated by the concave lens, which permits the IL method to fabricate a concave grating that bypasses the line spacing limitation of the conventional IL system. A concave grating with a line spacing of about 3.8 μm was fabricated and fitted inside a miniature spectrometer. The enlarged line spacing reduces the detector length by 66.5%, while keeping the resolution better than 1.5 nm over a wide spectral band (360 - 825 nm).
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