Open AccessFabrication of high-efficiency and low-stray-light grating by inductively coupled plasma(ICP) etching-polishing method
Author(s) -
Xiao Tan,
Qing Jiao,
Xiangdong Qi,
heshig bayan
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.005896
Subject(s) - polishing , materials science , stray light , optics , grating , etching (microfabrication) , inductively coupled plasma , optoelectronics , diffraction grating , fabrication , surface roughness , plasma , surface finish , diffraction efficiency , layer (electronics) , nanotechnology , composite material , medicine , physics , alternative medicine , quantum mechanics , pathology
Gratings with stray light of 4.99 × 10 -7 -5.67 × 10 -7 and efficiency of 93%-95% in a wavelength range of 1592 nm-1632 nm on Si-surface-modification SiC, fused silica and BK7 have been fabricated by the method of ICP etching-polishing. The CHF 3 and SF 6 plasma were used to etch a preliminary grating profile. Ar and O 2 plasma with low energy were then used to polish the grating to acquire low surface roughness and groove profiles closer to the ideal profiles. The morphologies of the gratings were characterized by AFM. The efficiencies and stray light were measured quantitatively by self-developed equipment. These results show that the ICP etching-polishing method is a promising candidate for production of good quality gratings into common optical materials.