Open AccessMultiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes
Author(s) -
Zhuo Xiong,
Tongbo Wei,
Yonghui Zhang,
Junxi Wang,
Jinmin Li
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.000a44
Subject(s) - light emitting diode , materials science , optoelectronics , lithography , diode , electrode , optics , electron beam lithography , light scattering , semiconductor , nanosphere lithography , light intensity , scattering , nanotechnology , fabrication , resist , physics , medicine , alternative medicine , layer (electronics) , pathology , quantum mechanics
Ni/Au electrodes with single, twined and triplet hole array patterns light-emitting diodes have been fabricated by multiple-exposure colloidal lithography. It is found that 45.6%, 83.6% and 15.5% improvement in light output at 350 mA has been achieved by patterning Ni/Au electrodes with single, twined, triplet hole arrays. In addition, patterned Ni/Au LEDs possess much larger view angles than non-patterned ones due to scattering effects of light around the holes, especially for triplet hole array patterned Ni/Au LEDs. Our proposed method for fabricating multiple holes structure would be very promising to improve light output power of LEDs when using advanced electrodes.