Open AccessInfluence of sphere-surface distance and exposure dose on resolution of sphere-lens-array lithography
Author(s) -
Xianchao Liu,
Xiong Li,
Ling Li,
Weidong Chen,
Xiangang Luo
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.030136
Subject(s) - photoresist , materials science , optics , lithography , polystyrene , lens (geology) , fabrication , photolithography , resist , wavelength , optoelectronics , focal length , nanotechnology , polymer , physics , medicine , alternative medicine , layer (electronics) , pathology , composite material
Sphere-surface distance and exposure dose effects on lithography resolution of microsphere lens array are studied. A transparent gap is introduced between photoresist film and polystyrene microspheres to adjust light distribution of photoresist surface. The pores size on the photoresist film varies when the gap thickness is changed. By optimization gap thickness and exposure dose, sub-100 nm surface patterning array is achieved for sphere of 2.06 µm diameter and optical wavelength λ of 400 nm theoretically and experimentally. Furthermore, when smaller polystyrene sphere (1.25 µm diameter) is chosen, spot width of 35 nm is realized by numerical calculation. This nano-fabrication method is simple, low-cost and high-efficiency, which can provide opportunities to make a variety of nano-devices, such as biosensors and nano-antennas.