Open AccessSubmicro-pillars and holes from the depth-wise Talbot images of a conical phase mask
Author(s) -
In-Ho Lee,
Seung Chul Park,
Sin Doo Lee
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.025866
Subject(s) - optics , lithography , conical surface , materials science , diffraction , talbot effect , micrometer , photoactive layer , phase (matter) , moiré pattern , optoelectronics , physics , energy conversion efficiency , quantum mechanics , composite material , polymer solar cell
We construct two-dimensional arrays of submicro-pillars and holes from the depth-wise Talbot images of a conical phase mask in a photoactive layer prepared on a quartz substrate. In contrast to the conventional Talbot lithography employing only one image in the photoactive layer, two images of the phase mask are produced in a depth-wise manner such that the pillar patterns are in the primary image plane while the hole patterns in the secondary image plane according to the penetration depth of the exposure energy. The conical symmetry plays a critical role in producing the covariant patterns of the phase mask in the photoactive layer through the suppression of higher orders of diffraction. Our two image-type approach is simple and versatile for producing different kinds of periodic structures for photonic applications and surface engineering on a micrometer-to-nanometer scale.