Open Accessλ/20 axial control in 25D polymerized structures fabricated with DLW lithography
Author(s) -
Gustavo de Miguel,
Martí Duocastella,
Giuseppe Vicidomini,
Alberto Diaspro
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.024850
Subject(s) - photopolymer , nanolithography , lithography , materials science , maskless lithography , optics , photonics , laser , optoelectronics , polymerization , nanoelectronics , wavelength , electron beam lithography , photolithography , nanometre , nanotechnology , polymer , fabrication , resist , physics , composite material , medicine , alternative medicine , pathology , layer (electronics)
An astonishing λ/20 height control is accomplished in 2.5D photopolymerized structures by taking advantage of the induced expansion of the resin. Our nanofabrication method is a one-pot approach with two processing steps: (i) regular 2.5D photopolymerization of the resin monomer by using multiphoton direct laser writing (DLW) lithography and (ii) spatially-selective irradiation of the photopolymerized features before development resulting in a nanometer-controlled height increase of the structure. The UV-visible-NIR sub-wavelength axial feature size (~40 nm) of this method allows fabricating devices with applications in multiple technological fields such as nanoelectronics and photonics.