Si and Cu ablation with a 469-nm laser focused by a toroidal mirror
Author(s) -
Yongpeng Zhao,
Huaiyu Cui,
Wenhong Zhang,
Wei Li,
Shan Jiang,
Lianbo Li
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.014126
Subject(s) - materials science , optics , ablation , laser , laser ablation , scintillator , toroid , beam (structure) , plasma , physics , quantum mechanics , detector , engineering , aerospace engineering
Si and Cu targets were ablated by a capillary-discharge 46.9-nm pumped laser beam, focused by a toroidal mirror at grazing incidence. The peak power density of the focal spot was ~2 × 10 7 W/cm 2 . Clear ablation patterns on the surfaces of Si and Cu targets were obtained, with shapes consistent with simulations.
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