Open AccessAchieving hard X-ray nanofocusing using a wedged multilayer Laue lens
Author(s) -
Xiaojing Huang,
Ray Conley,
Nathalie Bouet,
Juan Zhou,
Albert T. Macrander,
J. Mäser,
Hongyuan Yan,
Evgeny Nazaretski,
Kenneth Lauer,
Ross Harder,
Ian Robinson,
Sebastian Kalbfleisch,
Yong S. Chu
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.012496
Subject(s) - optics , fabrication , materials science , x ray optics , lens (geology) , characterization (materials science) , x ray , sputtering , focus (optics) , deposition (geology) , ray tracing (physics) , optoelectronics , thin film , physics , nanotechnology , medicine , paleontology , alternative medicine , pathology , sediment , biology
We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.