Open AccessSensitivity analysis and optimization method for the fabrication of one-dimensional beam-splitting phase gratings
Author(s) -
Shaun Pacheco,
Jonathan F. Brand,
Melissa Zaverton,
Tom D. Milster,
Rongguang Liang
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.011771
Subject(s) - optics , grating , fabrication , materials science , photolithography , diffraction efficiency , diffraction grating , electron beam lithography , beam (structure) , phase (matter) , optoelectronics , resist , physics , nanotechnology , quantum mechanics , medicine , alternative medicine , pathology , layer (electronics)
A method to design one-dimensional beam-spitting phase gratings with low sensitivity to fabrication errors is described. The method optimizes the phase function of a grating by minimizing the integrated variance of the energy of each output beam over a range of fabrication errors. Numerical results for three 1x9 beam splitting phase gratings are given. Two optimized gratings with low sensitivity to fabrication errors were compared with a grating designed for optimal efficiency. These three gratings were fabricated using gray-scale photolithography. The standard deviation of the 9 outgoing beam energies in the optimized gratings were 2.3 and 3.4 times lower than the optimal efficiency grating.