Open AccessPolarization control in flexible interference lithography for nano-patterning of different photonic structures with optimized contrast
Author(s) -
Jianfang He,
Xiaohui Fang,
Yuanhai Lin,
Xinping Zhang
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.011518
Subject(s) - optics , interference lithography , lithography , photonics , interference (communication) , photolithography , polarization (electrochemistry) , materials science , maskless lithography , next generation lithography , electron beam lithography , nano , x ray lithography , photonic crystal , optoelectronics , physics , nanotechnology , fabrication , resist , telecommunications , computer science , medicine , channel (broadcasting) , chemistry , alternative medicine , pathology , layer (electronics) , composite material
Half-wave plates were introduced into an interference-lithography scheme consisting of three fibers that were arranged into a rectangular triangle. Such a flexible and compact geometry allows convenient tuning of the polarizations of both the UV laser source and each branch arm. This not only enables optimization of the contrast of the produced photonic structures with expected square lattices, but also multiplies the nano-patterning functions of a fixed design of fiber-based interference lithography. The patterns of the photonic structures can be thus tuned simply by rotating a half-wave plate.