Open AccessAnalysis of mirror soft-x-ray–EUV scattering using generalized continuous growth model of multiscale reliefs
Author(s) -
Leonid I. Goray,
M. N. Lubov
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.010703
Subject(s) - extreme ultraviolet lithography , specular reflection , optics , scattering , reflection (computer programming) , physics , diffraction , boundary (topology) , surface finish , synchrotron radiation , boundary value problem , materials science , mathematical analysis , mathematics , computer science , quantum mechanics , composite material , programming language
Combined computer simulations of the growth of multilayer mirrors and their exact differential reflection coefficients in the soft-x-ray-EUV range have been conducted. The proposed model describes the variation of the surface roughness of the multilayer Al/Zr mirror boundary profiles taking into account a random noise source. Theoretically calculated Al/Zr boundary profiles allow one to know real rough boundary statistics including rms roughnesses and correlation lengths and, to obtain rigorously EUV specular and diffuse reflection coefficients. The proposed integrated approach opens up a way to performing exact theoretical studies similar in accuracy to results obtained by quantitative microscopy investigations of nanoreliefs and synchrotron radiation measurements.