Open AccessStructural design of photonic crystal thin film silicon solar cells by sensitivity analysis: Inclusion of electrode absorption
Author(s) -
Yosuke Kawamoto,
Yoshinori Tanaka,
Kenji Ishizaki,
Menaka De Zoysa,
Tanemasa Asano,
Susumu Noda
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.00a896
Subject(s) - materials science , photonic crystal , optoelectronics , absorption (acoustics) , thin film , optics , silicon , solar cell , electrode , plasmonic solar cell , layer (electronics) , monocrystalline silicon , nanotechnology , composite material , chemistry , physics
We carry out the structural design of photonic crystals (PCs) using sensitivity analysis for enhancing optical absorption of thin film microcrystalline silicon (μc-Si) solar cells. In this paper, we employ a model which includes absorption of not only the thin film μc-Si, but also the transparent conductive oxide and metal back reflector for design accuracy. We carry out structural design for this model using sensitivity analysis which maximizes optical absorption in μc-Si layer. As a result, we succeed in obtaining the maximum short circuit current density of 25.2 mA/cm2 for thin film (600-nm thick) μc-Si solar cells (1.4-fold increase compared to the case without a PC).