Open AccessUltra-compact and broadband Si photonics polarization rotator by self-alignment process
Author(s) -
Haifeng Zhou,
Chao Li,
Andy Lim Eu-Jin,
Litao Jia,
Mingbin Yu,
GuoQiang Lo
Publication year - 2015
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.006815
Subject(s) - optics , polarization rotator , polarization (electrochemistry) , materials science , photonics , silicon on insulator , lithography , broadband , optoelectronics , physics , silicon , birefringence , chemistry
An ultra-simple polarization rotator is demonstrated on SOI platform with self-aligned process to enhance performance repeatability and manufactural yield. The polarization rotation is essentially achieved by the symmetry breaking of a channel waveguide with a single-sided slab. The two-step lithography enabling this structure is fully compatible with the mainstream process flow of Si photonic integration. A polarization conversion efficiency of 93% is obtained at 1560nm in less than 10μm light propagation length. The merit of flat-band operation (> 100nm) by using asymmetric waveguide for polarization rotation is inherited.