Open AccessEpsilon-Near-Zero meta-lens for high resolution wide-field imaging
Author(s) -
Jisoo Kyoung,
Doo Jae Park,
Sun Jung Byun,
Jae-Ho Lee,
Soo Bong Choi,
Seongjun Park,
Sung Woo Hwang
Publication year - 2014
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.031875
Subject(s) - optics , resolution (logic) , lens (geology) , diffraction , materials science , near and far field , image resolution , wavelength , thin film , ptychography , physics , nanotechnology , artificial intelligence , computer science
Herein, we will propose a new application possibility of epsilon-near-zero (ENZ) materials: high resolution wide-field imaging. We show that the resolution can be dramatically enhanced by simply inserting a thin epsilon-near-zero (ENZ) material between the sample and substrate. By performing metal half-plane imaging, we experimentally demonstrate that the resolution could be enhanced by about 47% with a 300-nm-thick SiO 2 interlayer, an ENZ material at 8-μm-wavelength (1250 cm -1 ). The physical origin of the resolution enhancement is the strong conversion of diffracted near fields to quasi-zeroth order far fields enabled by the directive emission of ENZ materials.