Multiphoton microscopy as a detection tool for photobleaching of EO materials | Zendy

Shiva Shahin | Zendy; Soroush Mehravar | Zendy; Palash Gangopadhyay | Zendy; N. Peyghambarian | Zendy; Robert A. Norwood | Zendy; Khanh Kieu | Zendy

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Multiphoton microscopy as a detection tool for photobleaching of EO materials

Author(s) -

Shiva Shahin,

Soroush Mehravar,

Palash Gangopadhyay,

N. Peyghambarian,

Robert A. Norwood,

Khanh Kieu

Publication year - 2014

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.22.030955

Subject(s) - photobleaching , optics , microscopy , materials science , two photon excitation microscopy , second harmonic generation , characterization (materials science) , autofluorescence , fluorescence , optical microscope , fluorescence microscope , multiphoton fluorescence microscope , photon counting , nonlinear optics , optoelectronics , photon , nanotechnology , laser , scanning electron microscope , physics

Multi-photon microscopy operating at 1550 nm is employed as a rapid characterization tool for studying the photostability of three well-known electro-optical materials. Different nonlinear optical responses such as multi-photon excitation fluoresence, second-, and third-harmonic generation can be used as detection probes to reveal the degradation mechanisms. This technique is rapid, accurate, and can be used to study the photostability of a broad range of materials.

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