Open AccessMultiphoton microscopy as a detection tool for photobleaching of EO materials
Author(s) -
Shiva Shahin,
Soroush Mehravar,
Palash Gangopadhyay,
N. Peyghambarian,
Robert A. Norwood,
Khanh Kieu
Publication year - 2014
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.030955
Subject(s) - photobleaching , optics , microscopy , materials science , two photon excitation microscopy , second harmonic generation , characterization (materials science) , autofluorescence , fluorescence , optical microscope , fluorescence microscope , multiphoton fluorescence microscope , photon counting , nonlinear optics , optoelectronics , photon , nanotechnology , laser , scanning electron microscope , physics
Multi-photon microscopy operating at 1550 nm is employed as a rapid characterization tool for studying the photostability of three well-known electro-optical materials. Different nonlinear optical responses such as multi-photon excitation fluoresence, second-, and third-harmonic generation can be used as detection probes to reveal the degradation mechanisms. This technique is rapid, accurate, and can be used to study the photostability of a broad range of materials.