Open AccessGraphene oxide-based micropatterns via high-throughput multiphoton-induced reduction and ablation
Author(s) -
Yi Cheng Li,
Te Fu Yeh,
Hsin Chieh Huang,
Hsin Yu Chang,
Chun Yu Lin,
Cheng Li,
Chia Yuan Chang,
Hsisheng Teng,
Shean Jen Chen
Publication year - 2014
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.019726
Subject(s) - materials science , femtosecond , throughput , laser , graphene , digital micromirror device , optics , optoelectronics , laser ablation , micropatterning , point spread function , reduction (mathematics) , nanotechnology , computer science , physics , telecommunications , geometry , mathematics , wireless
In this study, a developed temporal focusing-based femtosecond laser system provides high-throughput multiphoton-induced reduction and ablation of graphene oxide (GO) films. Integrated with a digital micromirror device to locally control the laser pulse numbers, GO-based micropatterns can be quickly achieved instantly. Furthermore, the degree of reduction and ablation can be precisely adjusted via controlling the laser wavelength, power, and pulse number. Compared to point-by-point scanning laser direct writing, this approach offers a high-throughput and multiple-function approach to accomplish a large area of micro-scale patterns on GO films. The high-throughput micropatterning of GO via the temporal focusing-based femtosecond laser system fulfills the requirement of mass production for GO-based applications in microelectronic devices.