Open AccessThree-dimensional photonic crystals created by single-step multi-directional plasma etching
Author(s) -
Katsuyoshi Suzuki,
Keisuke Kitano,
Kenji Ishizaki,
Susumu Noda
Publication year - 2014
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.017099
Subject(s) - photonic crystal , materials science , reactive ion etching , wafer , transmittance , etching (microfabrication) , optoelectronics , photonics , optics , plasma etching , photonic integrated circuit , wavelength , photonic metamaterial , yablonovite , nanotechnology , physics , layer (electronics)
We fabricate 3D photonic nanostructures by simultaneous multi-directional plasma etching. This simple and flexible method is enabled by controlling the ion-sheath in reactive-ion-etching equipment. We realize 3D photonic crystals on single-crystalline silicon wafers and show high reflectance (>95%) and low transmittance (<-15dB) at optical communication wavelengths, suggesting the formation of a complete photonic bandgap. Moreover, our method simply demonstrates Si-based 3D photonic crystals that show the photonic bandgap effect in a shorter wavelength range around 0.6 μm, where further fine structures are required.