13-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates using InAlAs/GaAs dislocation filter layers
Author(s) -
Mingchu Tang,
Siming Chen,
Jiang Wu,
Qi Jiang,
V. G. Dorogan,
Mourad Benamara,
Yuriy I. Mazur,
Gregory J. Salamo,
A.J. Seeds,
Huiyun Liu
Publication year - 2014
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.011528
Subject(s) - materials science , optoelectronics , lasing threshold , superlattice , dislocation , gallium arsenide , laser , quantum dot , epitaxy , substrate (aquarium) , layer (electronics) , indium arsenide , quantum well , optics , nanotechnology , wavelength , physics , oceanography , geology , composite material
We compare InAlAs/GaAs and InGaAs/GaAs strained-layer superlattices (SLSs) as dislocation filter layers for 1.3-μm InAs/GaAs quantum-dot laser structures directly grown on Si substrates. InAlAs/GaAs SLSs are found to be more effective than InGaAs/GaAs SLSs in blocking the propagation of threading dislocations generated at the interface between the GaAs buffer layer and the Si substrate. Room-temperature lasing at ~1.27 μm with a threshold current density of 194 A/cm(2) and output power of ~77 mW has been demonstrated for broad-area lasers grown on Si substrates using InAlAs/GaAs dislocation filter layers.
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