Open AccessPhotolithographic patterning at sub-micrometer scale using a three-dimensional soft photo-mask with application on localized surface plasma resonance
Author(s) -
Yu Zen Chen,
Chun Ying Wu,
Yung-Chun Lee
Publication year - 2014
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.008376
Subject(s) - materials science , photolithography , optics , fabrication , micrometer , resist , coating , optoelectronics , nanolithography , ultraviolet , photoresist , nanotechnology , layer (electronics) , physics , alternative medicine , medicine , pathology
This paper presents a new method for fabricating arrayed metallic nano-structures with sub-micrometer line-widths over large patterning area sizes. It utilizes a soft mold containing arrayed surface micro-pyramids. A carbon-black photo-resist (PR) coating method is developed which can convert the soft mold into a photo-mask. This three-dimensional photo-mask is then applied for photolithographic ultraviolet (UV) patterning. In conjunction with standard metal lift-off process, arrayed metallic nano-structures are formed on glass substrates. A finite element simulation software is used to analyze the underlying mechanism of UV patterning using this new type of 3D photo-mask. The localized surface plasma resonance (LSPR) effects of the fabricated nano-structures are investigated both experimentally and theoretically. Good agreements are observed.