Open AccessSubwavelength multiple focal spots produced by tight focusing the patterned vector optical fields
Author(s) -
Meng-Qiang Cai,
Chenghou Tu,
Huihui Zhang,
Sheng-Xia Qian,
Kai Lou,
Yongnan Li,
HuiTian Wang
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.031469
Subject(s) - optics , femtosecond , wafer , diffraction , polarization (electrochemistry) , materials science , focal length , physics , cardinal point , spatial frequency , spatial light modulator , optoelectronics , laser , lens (geology) , chemistry
We numerically and experimentally explored generation and regulation of subwavelength multiple focal spots produced by tight focusing patterned vector optical fields (PVOFs). We presented a modified Richard-Wolf diffraction integration method suitable for the tight focusing of the PVOFs. By tailoring the spatial geometry and the polarization distributions of the PVOFs, simulations show that the diverse spatial configurations of subwavelength multiple focal spots can be achieved. To verify our idea, we experimentally generated the theoretically calculated examples of femtosecond PVOFs, then tightly focused them on the surface of the crystalline silicon wafers, and finally characterized the morphologies of modified surfaces. The SEM (scanning electronic microscopy) images confirmed that the experimental results are in good agreement with the simulations. Based on the diverse controlling degrees of freedom of PVOFs, the resultant subwavelength focal fields are flexible and powerful in parallel processing, optical manipulation and so on.