Open AccessStability of EUV multilayer coatings to low energy alpha particles bombardment
Author(s) -
Matteo Nardello,
Paola Zuppella,
Vanessa Polito,
Alain Jody Corso,
Sara Zuccon,
Maria Guglielmina Pelizzo
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.028334
Subject(s) - optical coating , extreme ultraviolet lithography , materials science , ion , irradiation , alpha particle , optics , extreme ultraviolet , energy (signal processing) , solar energy , alpha (finance) , optoelectronics , nanotechnology , atomic physics , thin film , laser , physics , nuclear physics , medicine , ecology , construct validity , nursing , quantum mechanics , patient satisfaction , biology
Future solar missions will investigate the Sun from very close distances and optical components are constantly exposed to low energy ions irradiation. In this work we present the results of a new experiment related to low energy alpha particles bombardments on Mo/Si multilayer optical coatings. Different multilayer samples, with and without a protecting capping layer, have been exposed to low energy alpha particles (4keV), fixing the ions fluency and varying the time of exposure in order to change the total dose accumulated. The experimental parameters have been selected considering the potential application of the coatings to future solar missions. Results show that the physical processes occurred at the uppermost interfaces can strongly damage the structure.